Comprehensive Analysis of Oligomeric Impurities, Monomer Composition, and End-Group Information in ArFPhotoresist Block Copolymers Using Q-TOF High-Resolution Mass Spectrometry
Postery
| 2025 | Agilent Technologies (ASMS)
LC/MS, LC/MS/MS, LC/TOF, LC/HRMS
Instrumentace
LC/MS, LC/MS/MS, LC/TOF, LC/HRMS
Výrobce
Agilent Technologies